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Proceedings Paper

Chromatic sensor-based- profilometer for the focusing mirror in the Scanning Helium Microscope
Author(s): D. Litwin; J. Galas; S. Sitarek; B. Surma; B. Piatkowski
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Paper Abstract

The paper is aimed at describing measurement methodology for characterizing quality of a silicon wafer applied as a focusing element in the Scanning Helium Microscope and continues the struggle against phenomena decreasing accuracy. The focusing mirror being the heart of the system and the decisive factor, which defines the resolution of the microscope, indicates the importance of testing methods. The systems made specially for this purpose provide the ability to create maps of the surface shape, thickness and surface roughness of the wafers. The paper shows many multidisciplinary issues associated with the measurements procedures and concludes with discussion on accuracy limits.

Paper Details

Date Published: 20 November 2008
PDF: 7 pages
Proc. SPIE 7141, 16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 71411T (20 November 2008); doi: 10.1117/12.822411
Show Author Affiliations
D. Litwin, Institute of Applied Optics (Poland)
J. Galas, Institute of Applied Optics (Poland)
S. Sitarek, Institute of Applied Optics (Poland)
B. Surma, Institute of Electronics Materials Technology (Poland)
B. Piatkowski, Institute of Electronics Materials Technology (Poland)


Published in SPIE Proceedings Vol. 7141:
16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Agnieszka Popiolek-Masajada; Elzbieta Jankowska; Waclaw Urbanczyk, Editor(s)

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