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Proceedings Paper

Design and study of efficiency of EUV condensor for illumination of large samples
Author(s): L. Sveda; L. Pina; V. Semencova; A. Inneman; A. Bartnik; H. Fiedorowicz; R. Rakowski
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Paper Abstract

Laser plasma source in WAT, Poland, is used as the source of EUV radiation for lithography and illumination of biological samples. The source has to be equipped with a complementary condensor with the goal of having a higher peak intensity than using current systems and moreover with the ability to illuminate larger areas homogeneously. The work concentrates on the analysis and design process of the optics based on the known source parameters, namely typical spectra, angular and intensity distributions and other constraints. Further, the question of illuminating the samples via multi shot approach by shifting the sample is discussed and estimates on the optimal sample shift in between two shots are explained.

Paper Details

Date Published: 20 November 2008
PDF: 5 pages
Proc. SPIE 7141, 16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 71410P (20 November 2008); doi: 10.1117/12.822370
Show Author Affiliations
L. Sveda, Czech Technical Univ. in Prague (Czech Republic)
Elya Solutions s.r.o. (Czech Republic)
L. Pina, Czech Technical Univ. in Prague (Czech Republic)
Rigaku Innovative Technologies Europe s.r.o. (Czech Republic)
V. Semencova, Rigaku Innovative Technologies Europe s.r.o. (Czech Republic)
A. Inneman, Rigaku Innovative Technologies Europe s.r.o. (Czech Republic)
A. Bartnik, WAT (Poland)
H. Fiedorowicz, WAT (Poland)
R. Rakowski, WAT (Poland)


Published in SPIE Proceedings Vol. 7141:
16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Agnieszka Popiolek-Masajada; Elzbieta Jankowska; Waclaw Urbanczyk, Editor(s)

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