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Proceedings Paper

Response of molecular solids to ultra-intense femtosecond soft x-ray pulses
Author(s): J. Chalupský; L. Juha; V. Hájková; J. Cihelka; L. Vysin; J. Gautier; J. Hajdu; S. P. Hau-Riege; M. Jurek; J. Krzywinski; Ri. A. London; E. Papalazarou; J. B. Pelka; G. Rey; S. Sebban; R. Sobierajski; N. Stojanovic; K. Tiedtke; S. Toleikis; T. Tschentscher; C. Valentin; H. Wabnitz; P. Zeitoun
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Paper Abstract

Ultra-fast soft x-ray lasers have opened a new area of laser-matter interactions which in most cases differ from the well understood interaction of UV-vis radiation with solid targets. The photon energy >30eV essentially exceeds the width of band gap in any known material and excites the electrons from the deep atomic and valence levels directly to the conduction band. Both thermal and non-thermal phenomena can occur in such a material being caused by electron thermalization and bond breaking, respectively. We report the first observation of non-thermal single-shot soft x-ray laser induced desorption occurring below the ablation threshold in a thin layer of poly (methyl methacrylate) - PMMA. Irradiated by the focused beam from the Free-electron LASer in Hamburg (FLASH) at 21.7nm, the samples have been investigated by an atomic-force microscope (AFM) enabling the visualization of mild surface modifications caused by the desorption. A model describing non-thermal desorption and ablation has been developed and used to analyze singleshot imprints in PMMA. An intermediate regime of materials removal has been found, confirming the model predictions. We also report below-threshold multiple-shot desorption of PMMA induced by high-order harmonics (HOH) at 32nm as a proof of an efficient material removal in the desorption regime.

Paper Details

Date Published: 18 May 2009
PDF: 9 pages
Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 736108 (18 May 2009); doi: 10.1117/12.822297
Show Author Affiliations
J. Chalupský, Institute of Physics (Czech Republic)
Czech Technical Univ. (Czech Republic)
L. Juha, Institute of Physics (Czech Republic)
V. Hájková, Institute of Physics (Czech Republic)
J. Cihelka, Institute of Physics (Czech Republic)
L. Vysin, Institute of Physics (Czech Republic)
Czech Technical Univ. (Czech Republic)
J. Gautier, Ecole Nationale Supérieure de Techniques Avancées (France)
J. Hajdu, Uppsala Univ. (Sweden)
S. P. Hau-Riege, Lawrence Livermore National Lab. (United States)
M. Jurek, Institute of Physics (Poland)
J. Krzywinski, Institute of Physics (Poland)
Ri. A. London, Lawrence Livermore National Lab. (United States)
E. Papalazarou, Ecole Nationale Supérieure de Techniques Avancées (France)
J. B. Pelka, Institute of Physics (Poland)
G. Rey, Ecole Nationale Supérieure de Techniques Avancées (France)
S. Sebban, Ecole Nationale Supérieure de Techniques Avancées (France)
R. Sobierajski, Institute of Physics (Poland)
N. Stojanovic, Deutsches Elektronen-Synchrotron (Germany)
K. Tiedtke, Deutsches Elektronen-Synchrotron (Germany)
S. Toleikis, Deutsches Elektronen-Synchrotron (Germany)
T. Tschentscher, Deutsches Elektronen-Synchrotron (Germany)
C. Valentin, Ecole Nationale Supérieure de Techniques Avancées (France)
H. Wabnitz, Deutsches Elektronen-Synchrotron (Germany)
P. Zeitoun, Ecole Nationale Supérieure de Techniques Avancées (France)


Published in SPIE Proceedings Vol. 7361:
Damage to VUV, EUV, and X-Ray Optics II
Libor Juha; Saša Bajt; Ryszard Sobierajski, Editor(s)

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