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Proceedings Paper

Damage studies of multilayer optics for XUV free electron lasers
Author(s): E. Louis; A. R. Khorsand; R. Sobierajski; E. D. van Hattum; M. Jurek; D. Klinger; J. B. Pelka; L. Juha; J. Chalupský; J. Cihelka; V. Hajkova; U. Jastrow; S. Toleikis; H. Wabnitz; K. I. Tiedtke; J. Gaudin; E. M Gullikson; F. Bijkerk
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Paper Abstract

We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.

Paper Details

Date Published: 18 May 2009
PDF: 6 pages
Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 73610I (18 May 2009); doi: 10.1117/12.822257
Show Author Affiliations
E. Louis, FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)
A. R. Khorsand, FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)
R. Sobierajski, FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)
Institute of Physics (Poland)
E. D. van Hattum, FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)
M. Jurek, Institute of Physics (Poland)
D. Klinger, Institute of Physics (Poland)
J. B. Pelka, Institute of Physics (Poland)
L. Juha, Institute of Physics (Czech Republic)
J. Chalupský, Institute of Physics (Czech Republic)
J. Cihelka, Institute of Physics (Czech Republic)
V. Hajkova, Institute of Physics (Czech Republic)
U. Jastrow, Deutsches Elektronen-Synchrotron (Germany)
S. Toleikis, Deutsches Elektronen-Synchrotron (Germany)
H. Wabnitz, Deutsches Elektronen-Synchrotron (Germany)
K. I. Tiedtke, Deutsches Elektronen-Synchrotron (Germany)
J. Gaudin, European XFEL, Deutsches Elektronen-Synchrotron (Germany)
E. M Gullikson, Lawrence Berkeley National Lab. (United States)
F. Bijkerk, FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)


Published in SPIE Proceedings Vol. 7361:
Damage to VUV, EUV, and X-Ray Optics II
Libor Juha; Saša Bajt; Ryszard Sobierajski, Editor(s)

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