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Proceedings Paper

Applicability of transmissive diffractive optics to high flux FEL radiation
Author(s): Thomas Nisius; Rolf Früke; David Schäfer; Marek Wieland; Thomas Wilhein
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Paper Abstract

EUV- and X-ray sources with laser like properties, e.g. free electron lasers, offer possibilities for many new experiments. In order to successfully plan and perform experiments at these high flux sources, it is necessary to know which kind of optics, exposed to the full beam, can be used. Due to the high intensities, it is not clear, whether transmissive diffractive optics are applicable, because these optics are usually fabricated on thin membranes, thus introducing additional absorption in the desired energy range. Since diffractive optics, especially zone plates, offer the possibility to achieve small spots when used as a focussing element and can also achieve good image quality in microscopic setups, their usage would facilitate many experiments, especially for their easy handling. As a proof of concept, we set up a zone plate based scanning transmission microscope at the unfocussed beamline BL3 at FLASH (DESY/Hamburg). The operating wavelength was 32 nm and 13.8 nm, respectively. While the first attempt, utilizing a zone plate composed of PMMA on silicon substrate failed due to ablation of the PMMA, a second zone plate (chromium on silicon nitride) was successfully used to focus the beam onto different samples (e.g. nickel-mesh and a silicon nitride structured sample). The resulting focal spot size was estimated from the acquired images to be in the range of 1 μm - 3μm in diameter. After several hours of exposure, no damage was visible to the optics. Beside the optics, different filters (Silicon/Zirconium, Zirconium and Aluminum) have been placed in the beam to evaluate possibilities to further reduce intensity which may be necessary if sensitive detectors are involved. All of the filters withstood the irradiation during the whole experiment.

Paper Details

Date Published: 18 May 2009
PDF: 6 pages
Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 73610Y (18 May 2009); doi: 10.1117/12.822159
Show Author Affiliations
Thomas Nisius, Univ. of Applied Sciences Koblenz (Germany)
Rolf Früke, Univ. of Applied Sciences Koblenz (Germany)
David Schäfer, Univ. of Applied Sciences Koblenz (Germany)
Marek Wieland, Univ. Hamburg (Germany)
Thomas Wilhein, Univ. of Applied Sciences Koblenz (Germany)


Published in SPIE Proceedings Vol. 7361:
Damage to VUV, EUV, and X-Ray Optics II
Libor Juha; Saša Bajt; Ryszard Sobierajski, Editor(s)

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