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Proceedings Paper

New alignment liquid crystal techniques for operation at harsh ambient conditions and high-intensity light
Author(s): Zbigniew Celinski; Lindsay Reisman; Ian Harward; Anatoliy Glushchenko
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Paper Abstract

Liquid crystal alignment is a key process in the production of modern display devices and other liquid crystal based optical elements. The traditional alignment procedures, dealing with treatment of organic films (rubbing, photopolymerization, ion beam treatment, etc), do not satisfy the increasing demands of modern technology. Because of the presence of a degradable polymer layer, none of these methods provides stability of the liquid crystal orientation for operation in high intensity visible, UV or infrared light. This problem can be solved using anisotropically treated inorganic thin films. The alignment is very sensitive; both polar and azimuthal anchoring energy parameters can be controlled by either conditions of the treatment process or the history of the inorganic film formation. The non-organic nature of the substrates provides non-degrading stability of the liquid crystals alignment while operating in high intensity visible, UV or infrared light. We demonstrate and discuss the use of this technology in many light modulating devices, including high intensity light phase retarders and displays operating at harsh ambient conditions.

Paper Details

Date Published: 7 May 2009
PDF: 5 pages
Proc. SPIE 7329, Three-Dimensional Imaging, Visualization, and Display 2009, 73290G (7 May 2009); doi: 10.1117/12.821413
Show Author Affiliations
Zbigniew Celinski, Univ. of Colorado at Colorado Springs (United States)
Lindsay Reisman, Univ. of Colorado at Colorado Springs (United States)
Ian Harward, Univ. of Colorado at Colorado Springs (United States)
Anatoliy Glushchenko, Univ. of Colorado at Colorado Springs (United States)


Published in SPIE Proceedings Vol. 7329:
Three-Dimensional Imaging, Visualization, and Display 2009
Bahram Javidi; Jung-Young Son; Manuel Martinez-Corral; Fumio Okano; Wolfgang Osten, Editor(s)

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