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Proceedings Paper

OFI argon excimer amplifier for intense subpicosecond VUV pulse generation
Author(s): M. Kaku; S. Kubodera; K. Oda; M. Katto; A. Yokotani; N. Miyanaga; K. Mima
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Paper Abstract

We have demonstrated an OFI Ar2* excimer VUV amplifier at 126 nm pumped by a high-intensity laser in the table top size. We observed the Ar2 * excimer emission centered at 126 nm with the spectral bandwidth of 10 nm (FWHM), which was produced in the OFI plasma. Significant amplification was observed inside the OFI Ar2 * excimer as a result of the optical feedback provided by a VUV reflector. The gain-length product of 5.6 was observed at the Ar pressure of 11 atm. The population inversion density on the order of 1017 cm-3 was evaluated inside the OFI plasma, which would be sufficient for the amplification of a subpicosecond VUV pulse at 126 nm produced by the harmonic generation.

Paper Details

Date Published: 21 April 2009
PDF: 6 pages
Proc. SPIE 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 71311C (21 April 2009); doi: 10.1117/12.820060
Show Author Affiliations
M. Kaku, Univ. of Miyazaki (Japan)
S. Kubodera, Univ. of Miyazaki (Japan)
K. Oda, Univ. of Miyazaki (Japan)
M. Katto, Univ. of Miyazaki (Japan)
A. Yokotani, Univ. of Miyazaki (Japan)
N. Miyanaga, Osaka Univ. (Japan)
K. Mima, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 7131:
XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
Rui Vilar; Olinda Conde; Marta Fajardo; Luís O. Silva; Margarida Pires; Andrei Utkin, Editor(s)

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