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Proceedings Paper

Site-specific dual ink dip pen nanolithography
Author(s): Omkar A. Nafday; Jason R. Haaheim; Fredy Villagran; Tom Levesque
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Paper Abstract

The ability to deposit two different materials with nanoscale precision at user specified locations is a very important attribute of dip pen nanolithography (DPN). However, the potential of DPN goes beyond simple deposition since DPN used in conjunction with lateral force microscopy (LFM) allows site-specific investigations of nanoscale properties. In this work, we use two different inks, 16-Mercaptohexadecanoic acid (MHA) and 1-octadenethiol (ODT) to show sitespecific dual ink DPN enabled exclusively by our proprietary software. A diamond-dot pattern was created by using a layer-to-layer alignment (LLA) algorithm which enables the MHA (diamond) to be written concentric with the ODT (central dot) pattern. This simple demonstration of multi-ink DPN is not specific to alkanethiol ink systems, but is also applicable to other multi-material patterning, interaction and exchange studies.

Paper Details

Date Published: 11 May 2009
PDF: 7 pages
Proc. SPIE 7318, Micro- and Nanotechnology Sensors, Systems, and Applications, 73180A (11 May 2009); doi: 10.1117/12.818918
Show Author Affiliations
Omkar A. Nafday, NanoInk, Inc. (United States)
Jason R. Haaheim, NanoInk, Inc. (United States)
Fredy Villagran, NanoInk, Inc. (United States)
Tom Levesque, NanoInk, Inc. (United States)

Published in SPIE Proceedings Vol. 7318:
Micro- and Nanotechnology Sensors, Systems, and Applications
Thomas George; M. Saif Islam; Achyut K. Dutta, Editor(s)

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