
Proceedings Paper
MEMS-enabled Dip Pen Nanolithography for directed nanoscale deposition and high-throughput nanofabricationFormat | Member Price | Non-Member Price |
---|---|---|
$14.40 | $18.00 |
![]() |
GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. | Check Access |
Paper Abstract
Precision nanoscale deposition is a fundamental requirement for nanoscience research, development, and commercial
implementation. Dip Pen Nanolithography(R) (DPN) is an inherently additive SPM-based technique which operates
under ambient conditions, making it suitable to deposit a wide range of biological and inorganic materials. This
technique is fundamentally enabled by a portfolio of MEMS devices tailored for microfluidic ink delivery, directed
placement of nanoscale materials via actuated cantilevers, and cm2 tip arrays for high-throughput nanofabrication.
Multiplexed deposition of nanoscale materials is a challenging problem, but we have implemented InkWells(TM) to enable
selective delivery of ink materials to different tips in multiple probe arrays, while preventing cross-contamination.
Active Pens(TM) can take advantage of this, directly place a variety of materials in nanoscale proximity, and do so in a
"clean" fashion since the cantilevers can be manipulated in Z. Further, massively parallel two-dimensional
nanopatterning with DPN is now commercially available via NanoInk's 2D nano PrintArray(TM), making DPN a highthroughput,
flexible and versatile method for precision nanoscale pattern formation. By fabricating 55,000 tip-cantilevers
across a 1 cm2 chip, we leverage the inherent versatility of DPN and demonstrate large area surface coverage, routinely
achieving throughputs of 3×107 μm2 per hour. Further, we have engineered the device to be easy to use, wire-free, and
fully integrated with the NSCRIPTOR's scanner, stage, and sophisticated lithography routines. In this talk we discuss the
methods of operating this commercially available device, and subsequent results showing sub-100 nm feature sizes and
excellent uniformity (standard deviation < 16%). Finally, we will discuss applications enabled by this MEMS portfolio
including: 1) rapidly and flexibly generating nanostructures; 2) chemically directed assembly and 3) directly writing
biological materials.
Paper Details
Date Published: 18 February 2009
PDF: 12 pages
Proc. SPIE 7207, Microfluidics, BioMEMS, and Medical Microsystems VII, 720706 (18 February 2009); doi: 10.1117/12.817396
Published in SPIE Proceedings Vol. 7207:
Microfluidics, BioMEMS, and Medical Microsystems VII
Wanjun Wang, Editor(s)
PDF: 12 pages
Proc. SPIE 7207, Microfluidics, BioMEMS, and Medical Microsystems VII, 720706 (18 February 2009); doi: 10.1117/12.817396
Show Author Affiliations
J. R. Haaheim, NanoInk, Inc. (United States)
O. A. Nafday, NanoInk, Inc. (United States)
T. Levesque, NanoInk, Inc. (United States)
O. A. Nafday, NanoInk, Inc. (United States)
T. Levesque, NanoInk, Inc. (United States)
Published in SPIE Proceedings Vol. 7207:
Microfluidics, BioMEMS, and Medical Microsystems VII
Wanjun Wang, Editor(s)
© SPIE. Terms of Use
