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Proceedings Paper

Alternative optical technologies: more than curiosities?
Author(s): Bruce W. Smith
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Paper Abstract

As optical lithography reaches it physical limits, alternative technologies become interesting. There have been several such alternatives that are still optical, but have some departure from conventional projection methods. This papers presents some of these alternative optical technologies, namely the use of surface plasmons and plasmonic lithography, metamaterials and superlenses, evanescent wave lithography, solid immersion lithography, and stimulated transmission depletion (StED) lithography. Additionally, the viability of interferometric lithography (IL) is addressed for application to sub-32nm generations by using an information content metric and comparing results to 193nm lithography, double patterning, and EUV.

Paper Details

Date Published: 16 March 2009
PDF: 10 pages
Proc. SPIE 7274, Optical Microlithography XXII, 727402 (16 March 2009); doi: 10.1117/12.817219
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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