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Proceedings Paper

A laser-plasma clean soft x-ray source for projection microlithography
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Paper Abstract

Within a National Project on nanotechnologies, at the ENEA Research Centre in Frascati a micro-exposure tool for projection lithography at 14.4 nm has been developed. The laser-plasma soft X-ray source is equipped with a patented debris mitigation system developed in the frame of a European Integrated Project, in order to preserve the collecting optics. A 90-nm-resolution patterning has been achieved on resist by this laboratory-scale tool based on a Schwarzschildtype projection optics.

Paper Details

Date Published: 22 April 2009
PDF: 9 pages
Proc. SPIE 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 713116 (22 April 2009); doi: 10.1117/12.816912
Show Author Affiliations
S. Bollanti, ENEA (Italy)
P. Di Lazzaro, ENEA (Italy)
F. Flora, ENEA (Italy)
L. Mezi, ENEA (Italy)
D. Murra, ENEA (Italy)
A. Torre, ENEA (Italy)


Published in SPIE Proceedings Vol. 7131:
XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
Rui Vilar; Olinda Conde; Marta Fajardo; Luís O. Silva; Margarida Pires; Andrei Utkin, Editor(s)

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