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Proceedings Paper

Analysis of Kohler illumination for 193 nm scatterfield microscope
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Paper Abstract

A scatterfield microscope using 193 nm laser light was developed that utilizes angle-resolved illumination for high resolution optical metrology. An angle scan module was implemented that scans the illumination beam in angle space at the sample by linearly scanning a fiber aperture at a conjugate back focal plane. The illumination light is delivered directly from a source laser via an optical fiber in order to achieve homogeneous angular illumination. A unique design element is that the conjugate back focal plane (CBFP) is telecentric allowing the optical axis of the fiber to be scanned linearly. Initial results from full field and angle-resolved illumination are presented and potential applications in semiconductor metrology are described.

Paper Details

Date Published: 23 March 2009
PDF: 9 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723T (23 March 2009); doi: 10.1117/12.816624
Show Author Affiliations
Yeung Joon Sohn, National Institute of Standards and Technology (United States)
Richard Quintanilha, National Institute of Standards and Technology (United States)
Lowell Howard, National Institute of Standards and Technology (United States)
Richard M. Silver, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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