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Proceedings Paper

Improving optical measurement accuracy using multi-technique nested uncertainties
Author(s): R. M. Silver; N. F. Zhang; B. M. Barnes; H. Zhou; A. Heckert; R. Dixson; T. A. Germer; B. Bunday
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Paper Abstract

This paper compares and contrasts different combinations of scatterfield and scatterometry optical configurations as well as introduces a new approach to embedding atomic force microscopy (AFM) or other reference metrology results directly in the uncertainty analysis and library-fitting process to reduce parametric uncertainties. We present both simulation results and experimental data demonstrating this new method, which is based on the application of a Bayesian analysis to library-based regression fitting of optical critical dimension (OCD) data. We develop the statistical methods to implement this approach of nested uncertainty analysis and give several examples, which demonstrate reduced uncertainties in the final combined measurements. The approach is also demonstrated through a combined reference metrology application using several independent measurement methods.

Paper Details

Date Published: 18 March 2009
PDF: 14 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727202 (18 March 2009); doi: 10.1117/12.816569
Show Author Affiliations
R. M. Silver, National Institute of Standards and Technology (United States)
N. F. Zhang, National Institute of Standards and Technology (United States)
B. M. Barnes, National Institute of Standards and Technology (United States)
H. Zhou, National Institute of Standards and Technology (United States)
A. Heckert, National Institute of Standards and Technology (United States)
R. Dixson, National Institute of Standards and Technology (United States)
T. A. Germer, National Institute of Standards and Technology (United States)
B. Bunday, SEMATECH, Inc. (United States)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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