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Proceedings Paper

Characterization of a 0.25NA full-field EUV exposure tool
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Paper Abstract

The performance of a 0.25NA full-field EUV exposure tool is characterized in terms of CD uniformity, focus and overlay control, as well as dose uniformity. In addition to the characterization of the scanner, we explore the use of scatterometry techniques for the measurements of extremely fine resolution features, with critical dimensions below 40 nm. The stability of the scanner performance over an extended period of time is assessed.

Paper Details

Date Published: 19 March 2009
PDF: 11 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727121 (19 March 2009); doi: 10.1117/12.816545
Show Author Affiliations
Oleg Kritsun, GLOBALFOUNDRIES, Inc. (United States)
Bruno La Fontaine, GLOBALFOUNDRIES, Inc. (United States)
Yudong Hao, Nanometrics Inc. (United States)
Jie Li, Nanometrics Inc. (United States)
Obert Wood, GLOBALFOUNDRIES, Inc. (United States)
Sudharshanan Raghunathan, GLOBALFOUNDRIES, Inc. (United States)
Tim Brunner, IBM Corp. (United States)
Chiew-Seng Koay, IBM Corp. (United States)
Hiroyuki Mizuno, Toshiba America Electronics Components (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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