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Proceedings Paper

The nebulous hotspot and algorithm variability
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Paper Abstract

Computation lithography relies on algorithms. These algorithms exhibit variability that can be as much as 5% (1 σ) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application.

Paper Details

Date Published: 12 March 2009
PDF: 9 pages
Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 727509 (12 March 2009); doi: 10.1117/12.816449
Show Author Affiliations
Alfred K. K. Wong, Magma Design Automation, Inc. (United States)
Edmund Y. Lam, The Univ. of Hong Kong (Hong Kong, China)

Published in SPIE Proceedings Vol. 7275:
Design for Manufacturability through Design-Process Integration III
Vivek K. Singh; Michael L. Rieger, Editor(s)

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