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Proceedings Paper

Evaluation of a new photoresist dispense system to detect coating variation
Author(s): Florent Gapin; Bernard Le-Peutrec; Laurent Stock; Marc Hanotte
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Paper Abstract

A minimal change of dispensed volume will have a severe impact on the film thickness uniformity and in the worst case there might be some lack of resist on the wafer. Therefore it is essential to set-up the photoresist dispense accurately to avoid any dispense variation. In addition, it is important to monitor the dispense conditions real-time to detect problems which may have a direct negative impact on process yield. This paper presents the evaluation of the IntelliGen® Mini dispense system which is manufactured by Entegris, Inc. This new system is able to detect variations like bubbles in the dispense line, changes to the stop suckback valve, and changes in viscosity1. After an explanation of the pump characteristics and the potential root causes of dispense variation and their consequences, the evaluation done in Altis Semiconductor will be presented. The study has been made utilizing different photo-chemicals, including low and mid-range viscosity photo- resists and anti-reflective coatings. The capability of this new product to detect any perturbation of coating will be demonstrated. Then standard tests like coating repeatability, defect density CD uniformity and finally wafer yield inspection will be performed to prove efficiency of the system in a production mode.

Paper Details

Date Published: 23 March 2009
PDF: 8 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723L (23 March 2009); doi: 10.1117/12.816117
Show Author Affiliations
Florent Gapin, Altis Semiconductor (France)
Bernard Le-Peutrec, Altis Semiconductor (France)
Laurent Stock, Entegris S.A.S. (France)
Marc Hanotte, Entegris S.A.S. (France)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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