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Proceedings Paper

Robust self-matching based focus measure
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Paper Abstract

This paper proposes a novel focus measure based on self-matching methods. A unique pencil-shaped profile is identified by comparing the similarity between patterns extracted around their neighborhood in each scene. Based on this, a new criterion function, CPV, is defined to evaluate focused or defocused scenes. OCM is recommended due to its invariance with regards to contrasts. Experiments using a telecentric lens are implemented to demonstrate the efficiency of proposed measure. Comparing OCM-based focus measure with conventional focus measures shows that OCM-based CPV is robust against illuminations. Using this method, pan-focused images are composed and depth information is represented.

Paper Details

Date Published: 17 November 2008
PDF: 11 pages
Proc. SPIE 7266, Optomechatronic Technologies 2008, 72661P (17 November 2008); doi: 10.1117/12.816074
Show Author Affiliations
Yuan Li, Hokkaido Univ. (Japan)
Hidenori Takauji, Hokkaido Univ. (Japan)
Shun'ichi Kaneko, Hokkaido Univ. (Japan)
Takayuki Tanaka, Hokkaido Univ. (Japan)
Isao Ohmura, Hokkaido Industrial Research Institute (Japan)


Published in SPIE Proceedings Vol. 7266:
Optomechatronic Technologies 2008
John T. Wen; Dalibor Hodko; Yukitoshi Otani; Jonathan Kofman; Okyay Kaynak, Editor(s)

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