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Proceedings Paper

Chemically amplified hybrid resist platform for i-line applications
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Paper Abstract

Three polymer platforms based on acid labile blocked novolaks were investigated. The first, blended with Polyhydroxystyrene/ t-butylacrylate (PHSC), produced incompatible blends for the most part. Compatible blends were obtained for the second platform by reacting novolak and PHSC together with alkylvinylether, which was optimized for resist performance on Cu substrate at and below 10 μm film thickness. The third platform, based on a modified novolak resin, achieved greater than 5 aspect ratio in 25 μm thick films.

Paper Details

Date Published: 1 April 2009
PDF: 7 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72730J (1 April 2009); doi: 10.1117/12.816044
Show Author Affiliations
Medhat Toukhy, AZ Electronic Materials USA Corp. (United States)
Margareta Paunescu, AZ Electronic Materials USA Corp. (United States)
Zachary Bogusz, AZ Electronic Materials USA Corp. (United States)
Georg Pawlowski, AZ Electronic Materials USA Corp. (United States)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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