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Proceedings Paper

Study of optical material anisotropy using scanning millimeter wave beam
Author(s): Albertas Laurinavičius; Vadim Derkach; Tomas Anbinderis
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Paper Abstract

Millimeter wave bridge technique for non-destructive material homogeneity characterization is described. The idea of this technique is the local excitation of the millimeter waves in the testing material and the measurement of the transmitted (reflected) wave amplitude and phase in different places of it, i.e. the material plate is scanned by the beam of the millimeter waves. Same results of the homogeneity measurements for dielectric wafers according to dielectric constant anisotropy are presented. The measurement technique sensitivity is discussed.

Paper Details

Date Published: 2 December 2008
PDF: 6 pages
Proc. SPIE 7142, Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6), 71420C (2 December 2008); doi: 10.1117/12.815946
Show Author Affiliations
Albertas Laurinavičius, Semiconductor Physics Institute (Lithuania)
Vadim Derkach, Usikov Institute of Radiophysics and Electronics of NAS of Ukraine (Ukraine)
Tomas Anbinderis, Elmika Ltd. (Lithuania)


Published in SPIE Proceedings Vol. 7142:
Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6)

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