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Proceedings Paper

Resist line-edge roughness modeling for continuous space simulations
Author(s): Yuan He; Hong Chen; Anton J. Devilliers
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Date Published:
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Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, ; doi: 10.1117/12.815697
Show Author Affiliations
Yuan He, Micron Technology, Inc. (United States)
Hong Chen, Micron Technology, Inc. (United States)
Anton J. Devilliers, Micron Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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