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Proceedings Paper

Silicone based artificial skin for humanoid facial expressions
Author(s): Yonas Tadesse; David Moore; Nick Thayer; Shashank Priya
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Paper Abstract

Artificial skin materials were synthesized using platinum-cured silicone elastomeric material (Reynolds Advanced Materials Inc.) as the base consisting of mainly polyorganosiloxanes, amorphous silica and platinum-siloxane complex compounds. Systematic incorporation of porosity in this material was found to lower the force required to deform the skin in axial direction. In this study, we utilized foaming agents comprising of sodium bicarbonate and dilute form of acetic acid for modifying the polymeric chain and introducing the porosity. Experimental determination of functional relationship between the concentration of foaming agent, slacker and non-reactive silicone fluid and that of force - deformation behavior was conducted. Tensile testing of material showed a local parabolic relationship between the concentrations of foaming agents used (per milliliter of siloxane compound) and strain. This data can be used to optimize the amount of additives in platinum cured silicone to obtain desired force - displacement characteristics. Addition of "silicone thinner" and "slacker" showed a monotonically increasing strain behavior. A mathematical model was developed to arrive at the performance metrics of artificial skin.

Paper Details

Date Published: 6 April 2009
PDF: 10 pages
Proc. SPIE 7287, Electroactive Polymer Actuators and Devices (EAPAD) 2009, 728709 (6 April 2009); doi: 10.1117/12.815684
Show Author Affiliations
Yonas Tadesse, Virginia Polytechnic Institute and State Univ. (United States)
David Moore, Virginia Polytechnic Institute and State Univ. (United States)
Nick Thayer, Virginia Polytechnic Institute and State Univ. (United States)
Shashank Priya, Virginia Polytechnic Institute and State Univ. (United States)


Published in SPIE Proceedings Vol. 7287:
Electroactive Polymer Actuators and Devices (EAPAD) 2009
Yoseph Bar-Cohen; Thomas Wallmersperger, Editor(s)

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