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Proceedings Paper

Low temperature deposition of carbon nanotubes
Author(s): Kyung-Nam Kang; Yoonyoung Jin; Pratul K. Ajmera; Sunggook Park
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Paper Abstract

We introduce a novel method for low substrate temperature carbon nanotube (CNT) deposition utilizing photo-chemical vapor deposition (PCVD). Aluminum and nickel catalyst layers are deposited on thermally oxidized silicon substrates for CNT growth. The catalyst layers of varying thicknesses are deposited by electron beam evaporation. Different catalyst annealing temperatures and pressures are investigated. The CNT deposition is carried out immediately following the annealing process. The presence of light source during CNT deposition assists in fragmentation of the CCl4 precursor molecules used, thereby permitting a lower substrate temperature during growth. We have successfully deposited CNTs at substrate temperatures as low as 400 °C by this technique.

Paper Details

Date Published: 31 March 2009
PDF: 8 pages
Proc. SPIE 7291, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2009, 729112 (31 March 2009); doi: 10.1117/12.815578
Show Author Affiliations
Kyung-Nam Kang, Louisiana State Univ. (United States)
Yoonyoung Jin, Louisiana State Univ. (United States)
Pratul K. Ajmera, Louisiana State Univ. (United States)
Sunggook Park, Louisiana State Univ. (United States)

Published in SPIE Proceedings Vol. 7291:
Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2009
Vijay K. Varadan, Editor(s)

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