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Proceedings Paper

Methodologies for evaluating CD-matching of CD-SEM
Author(s): Hiroki Kawada; Chih-Ming Ke; Ya-Chun Cheng; Yu-Hsi Wang
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Paper Abstract

As CD-SEM's precision is severely controlled by sub-nanometer level, we have to evaluate not only repeatability of tools but also CD-matching between the individual tools. However, it is not easy to measure the CD-matching precisely ± 0.1nm due to repeatability error, stability change, carryover effect, statistical fluctuation of sampling, etc. varying in the individual tools. In this work uncertainty of ABBA test is experimentally estimated with self-ABBA test. Sample's carryover trend that dominates uncertainty of the test can be checked. Mathematical consideration implements precise calculation of the ABBA test.

Paper Details

Date Published: 23 March 2009
PDF: 9 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720Y (23 March 2009); doi: 10.1117/12.815186
Show Author Affiliations
Hiroki Kawada, Hitachi High-Technologies Corp. (Japan)
Chih-Ming Ke, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Ya-Chun Cheng, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Yu-Hsi Wang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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