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Proceedings Paper

Step and flash imprint lithography for manufacturing patterned media
Author(s): Cynthia Brooks; Gerard M. Schmid; Mike Miller; Steve Johnson; Niyaz Khusnatdinov; Dwayne LaBrake; Douglas J. Resnick; S. V. Sreenivasan
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Paper Abstract

The ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 1012 bits per square inch. Step and Flash Imprint Lithography (S-FIL) technology has been employed to pattern the hard disk substrates. This paper discusses the infrastructure required to enable S-FIL in high-volume manufacturing; namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, and dual-sided imprinting. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/hour (dualsided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.

Paper Details

Date Published: 18 March 2009
PDF: 12 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72711L (18 March 2009); doi: 10.1117/12.815016
Show Author Affiliations
Cynthia Brooks, Molecular Imprints, Inc. (United States)
Gerard M. Schmid, Molecular Imprints, Inc. (United States)
Mike Miller, Molecular Imprints, Inc. (United States)
Steve Johnson, Molecular Imprints, Inc. (United States)
Niyaz Khusnatdinov, Molecular Imprints, Inc. (United States)
Dwayne LaBrake, Molecular Imprints, Inc. (United States)
Douglas J. Resnick, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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