Share Email Print
cover

Proceedings Paper

OPC segmentation: dilemma between degree-of-freedom and stability with some relieves
Author(s): Y. P. Tang; J. H. Feng; M. H. Chih; C. K. Tsai; W. C. Huang; C. C. Kuo; R. G. Liu; H. T. Lin; Y. C. Ku
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

It is believed that smaller correction segments could achieve better pattern fidelity, however, some unstable OPC results which are beyond the capability of common OPC correction schemes were found once the segment length is less than a certain threshold. The dilemma between offering more degree-of-freedom by decreasing the correction segment length at the cost of longer correction time and the instability induced by the reduced segment length challenges every OPC engineer. In this paper, 2 indices are introduced; the segmentation index is proposed to determine a reasonable minimum segment length while the stability index can be used to examine whether the correction system is a stiff convergence problem. A compromised correction algorithm is also proposed to consider the OPC accuracy, stability and runtime simultaneously. The correction results and the runtime are analyzed.

Paper Details

Date Published: 16 March 2009
PDF: 10 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72742G (16 March 2009); doi: 10.1117/12.814907
Show Author Affiliations
Y. P. Tang, Taiwan Semiconductor Manufacturing Co. (Taiwan)
J. H. Feng, Taiwan Semiconductor Manufacturing Co. (Taiwan)
M. H. Chih, Taiwan Semiconductor Manufacturing Co. (Taiwan)
C. K. Tsai, Taiwan Semiconductor Manufacturing Co. (Taiwan)
W. C. Huang, Taiwan Semiconductor Manufacturing Co. (Taiwan)
C. C. Kuo, Taiwan Semiconductor Manufacturing Co. (Taiwan)
R. G. Liu, Taiwan Semiconductor Manufacturing Co. (Taiwan)
H. T. Lin, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Y. C. Ku, Taiwan Semiconductor Manufacturing Co. (Taiwan)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

© SPIE. Terms of Use
Back to Top