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Proceedings Paper

PAG segregation during exposure affecting innate material roughness
Author(s): Theodore H. Fedynyshyn; David K. Astolfi; Alberto Cabral; Susan Cann; Indira Pottebaum; Jeanette M. Roberts
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Paper Abstract

We have developed an improved AFM-based technique to measure intrinsic material roughness (IMR) after base development. We have investigated the contribution of different polymeric PAGs to IMR. These polymeric PAGs include copolymers of several styrenic PAGs with hydroxystyrene. The IMR of these polymer-bound PAGs is reduced relative to that of their nonpolymeric counterparts with DUV exposure. Theses results represent further evidence for PAG segregation during the bake steps as being responsible for increased IMR in exposed resists, presumably by increasing the dissolution rate inhomogeneity on a nano-scale level. The work also shows that the effects of PAG segregation can be mitigated by employing polymer-bound PAGs.

Paper Details

Date Published: 1 April 2009
PDF: 11 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 727349 (1 April 2009); doi: 10.1117/12.814811
Show Author Affiliations
Theodore H. Fedynyshyn, MIT Lincoln Lab. (United States)
David K. Astolfi, MIT Lincoln Lab. (United States)
Alberto Cabral, MIT Lincoln Lab. (United States)
Susan Cann, MIT Lincoln Lab. (United States)
Indira Pottebaum, MIT Lincoln Lab. (United States)
Jeanette M. Roberts, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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