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A methodology to identify patterns limiting the lithography process window of layouts
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Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, ; doi: 10.1117/12.814719
Show Author Affiliations
Kai Peter, Infineon Technologies AG (Germany)
Reinhard März, Infineon Technologies AG (Germany)
Hanno Melzner, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 7275:
Design for Manufacturability through Design-Process Integration III
Vivek K. Singh; Michael L. Rieger, Editor(s)

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