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Proceedings Paper

Advanced micromachining combining nanosecond lasers with water jet-guided laser technology
Author(s): A. Pauchard; K. Lee; N. Vago; M. Pavius; S. Obi
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Paper Abstract

This paper presents the first scribing results obtained by combining a short-pulse 10ns green laser with the water jet-guided laser technology. A number of high-potential applications are presented, from the grooving of low-k silicon wafers, the scribing of metallic and amorphous Si layers of thin film solar cells, the grooving of SiC wafers, and dot marking of Si wafers. The combination of a short pulse laser beam with the water jet-guided laser technology offers a new industry-proven alternative for grooving and scribing processes, providing superior speed and quality compared to legacy laser technologies.

Paper Details

Date Published: 24 February 2009
PDF: 9 pages
Proc. SPIE 7201, Laser Applications in Microelectronic and Optoelectronic Manufacturing VII, 72010A (24 February 2009); doi: 10.1117/12.814712
Show Author Affiliations
A. Pauchard, Synova SA (Switzerland)
K. Lee, Synova SA (Switzerland)
N. Vago, Synova SA (Switzerland)
M. Pavius, Synova SA (Switzerland)
S. Obi, Synova SA (Switzerland)

Published in SPIE Proceedings Vol. 7201:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VII
Michel Meunier; Andrew S. Holmes; Hiroyuki Niino; Bo Gu, Editor(s)

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