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PAG, shot noise, and LER in EUV photoresists
Author(s): Christopher N. Anderson; Patrick P. Naulleau
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Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 727348; doi: 10.1117/12.814646
Show Author Affiliations
Christopher N. Anderson, Univ. of California, Berkeley (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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