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Proceedings Paper

Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components
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Paper Abstract

Large-scale fabrication of micro-optical Guided-Mode-Resonance (GMR) components using VLSI techniques is desirable, due to the planar system integration capabilities it enables, especially with laser resonator technology. However, GMR performance is dependent on within-wafer as well as wafer-to-wafer lithographic process variability, and pattern transfer fidelity of the final component in the substrate. The fabrication of lithographs below the g-line stepper resolution limit is addressed using multiple patterning. We report results from computational simulations, fabrication and optical reflectance measurements of GMR mirrors and filters (designed to perform around the wavelength of 1550nm), with correlations to lithographic parameter variability, such as photoresist exposure range and etch depth. The dependence of the GMR resonance peak wavelength, peak bandwidth are analyzed as a function of photolithographic fabrication tolerances and process window.

Paper Details

Date Published: 24 February 2009
PDF: 9 pages
Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050Y (24 February 2009); doi: 10.1117/12.814514
Show Author Affiliations
Menelaos K. Poutous, The Univ. of North Carolina at Charlotte (United States)
Zach Roth, The Univ. of North Carolina at Charlotte (United States)
Kaia Buhl, The Univ. of North Carolina at Charlotte (United States)
Aaron Pung, The Univ. of North Carolina at Charlotte (United States)
Raymond C. Rumpf, Prime Research, LC (United States)
Eric G. Johnson, The Univ. of North Carolina at Charlotte (United States)


Published in SPIE Proceedings Vol. 7205:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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