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Proceedings Paper

Direct laser write (DLW) as a versatile tool in manufacturing templates for imprint lithography on flexible substrates
Author(s): Marius G. Ivan; Jean-Baptiste Vaney; Dick Verhaart; Erwin R. Meinders
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Paper Abstract

A computer-controlled laser beam recorder with a wavelength of 405 nm has been employed for patterning the deposited resist with feature sizes varying from a few hundreds of nanometers to tens of micrometers. Four inch silicon templates for hot embossing source/ drain electrodes and metallic circuit for a disposable biosensor were obtained. SEM and optical microscopy reveal accurate transfer of developed photoresist structures into the underlying silicon wafer after plasma dry etching. Etch depths between 100 - 600 nm were obtained on the templates, and were further transferred into the imprinted plastic substrate and the metallic layer.

Paper Details

Date Published: 18 March 2009
PDF: 8 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72711S (18 March 2009); doi: 10.1117/12.814481
Show Author Affiliations
Marius G. Ivan, TNO Science and Industry (Netherlands)
Jean-Baptiste Vaney, TNO Science and Industry (Netherlands)
Dick Verhaart, Singulus Mastering B.V. (Netherlands)
Erwin R. Meinders, TNO Science and Industry (Netherlands)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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