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Proceedings Paper

Investigation on full-chip-based proximity matching procedure for sub-50-nm memory device
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Proc. SPIE 7274, Optical Microlithography XXII, ; doi: 10.1117/12.814479
Show Author Affiliations
Chan Hwang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sangho Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeong-Ho Yeo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seong-Woon Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Woo-Sung Han, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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