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Proceedings Paper

Challenging three-dimension scatterometry measurements for 32-45-nm node BEOL process control
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Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, ; doi: 10.1117/12.814467
Show Author Affiliations
Stephane Godny, Nova Measuring Instruments Ltd. (Israel)
Igor Turovets, Nova Measuring Instruments Ltd. (Israel)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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