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Proceedings Paper

Process control for improvement of metal layer overlay accuracy in 90-nm node
Author(s): Chan Sik Park; Eunsoo Jeong; Myungsoo Kim; Kwang-Seon Choi; Jae-Won Han
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Proc. SPIE 7274, Optical Microlithography XXII, ; doi: 10.1117/12.814464
Show Author Affiliations
Chan Sik Park, Dongbu HiTek Co., Ltd. (Korea, Republic of)
Eunsoo Jeong, Dongbu HiTek Co., Ltd. (Korea, Republic of)
Myungsoo Kim, Dongbu HiTek Co., Ltd. (Korea, Republic of)
Kwang-Seon Choi, Dongbu HiTek Co., Ltd. (Korea, Republic of)
Jae-Won Han, Dongbu HiTek Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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