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Proceedings Paper

Demonstration of 32nm half-pitch electrical testable NAND FLASH patterns using self-aligned double patterning
Author(s): Shiyu Sun; Chris Bencher; Yongmei Chen; Huixiong Dai; Man-Ping Cai; Jaklyn Jin; Pokhui Blanco; Liyan Miao; Ping Xu; Xumou Xu; James Yu; Raymond Hung; Shiany Oemardani; Osbert Chan; Chorng-Ping Chang; Chris Ngai
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Paper Abstract

Self-Aligned Double patterning (SADP) technology has been identified as the main stream patterning technique for NAND FLASH manufacturers for 3xnm and beyond. This paper demonstrates the successful fabrication of 32nm halfpitch electrical testable NAND FLASH wordline structures using a 3-mask flow. This 3-mask flow includes one critical lithography step and two non-critical lithography steps. It uses a positive tone (spacer as mask) approach to create 32nm doped poly wordlines. Electrical measurements of line resistance are performed on these doped poly wordlines to demonstrate the capability of this patterning technique. Detailed results and critical process considerations, including lithography, deposition and etch, will be discussed in this paper.

Paper Details

Date Published: 16 March 2009
PDF: 7 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72740D (16 March 2009); doi: 10.1117/12.814403
Show Author Affiliations
Shiyu Sun, Applied Materials, Inc. (United States)
Chris Bencher, Applied Materials, Inc. (United States)
Yongmei Chen, Applied Materials, Inc. (United States)
Huixiong Dai, Applied Materials, Inc. (United States)
Man-Ping Cai, Applied Materials, Inc. (United States)
Jaklyn Jin, Applied Materials, Inc. (United States)
Pokhui Blanco, Applied Materials, Inc. (United States)
Liyan Miao, Applied Materials, Inc. (United States)
Ping Xu, Applied Materials, Inc. (United States)
Xumou Xu, Applied Materials, Inc. (United States)
James Yu, Applied Materials, Inc. (United States)
Raymond Hung, Applied Materials, Inc. (United States)
Shiany Oemardani, Applied Materials, Inc. (United States)
Osbert Chan, Applied Materials, Inc. (United States)
Chorng-Ping Chang, Applied Materials, Inc. (United States)
Chris Ngai, Applied Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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