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Proceedings Paper

SEMATECH research activities on EUV full-field exposure tool
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Proc. SPIE 7271, Alternative Lithographic Technologies, 72710V; doi: 10.1117/12.814383
Show Author Affiliations
Liping Ren, SEMATECH, Inc. (United States)
Frank Goodwin, SEMATECH, Inc. (United States)
Stefan Wurm, SEMATECH, Inc. (United States)
Chawon Koh, SEMATECH, Inc. (United States)
Long He, SEMATECH, Inc. (United States)
Cecilia Montgomery, SEMATECH, Inc. (United States)
Sungmin Huh, SEMATECH, Inc. (United States)
Sudharshanan Raghunathan, Univ. at Albany (United States)
John G. Hartley, Univ. at Albany (United States)
Brian Lee, ASML US, Inc. (United States)
Brian Niekrewicz, ASML US, Inc. (United States)
Kevin D. Cummings, ASML US, Inc. (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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