Share Email Print
cover

Proceedings Paper

Lithography aware statistical context characterization of 40nm logic cells
Author(s): Mark E. Rubin; Naohiro Kobayashi; Toshiaki Yanagihara
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

At the 40nm technology node, lithographic effects have a significant impact on the electrical characteristics of CMOS transistors, which directly affects the performance of circuits containing these devices. Many of these effects are systematic and intra-cell, and can therefore be accurately modeled by accounting for layout proximity effects during cell characterization. However, because the final cell placement for real designs is not known at the time of characterization, inter-cell proximity variations cannot be treated systematically at that time. We present a method to analyze inter-cell proximity variation statistically, and approximate the effect of context as a random variable during full chip verification. We then show an example analysis applied to standard logic cells in a 40nm technology.

Paper Details

Date Published: 13 March 2009
PDF: 9 pages
Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72751C (13 March 2009); doi: 10.1117/12.814371
Show Author Affiliations
Mark E. Rubin, Synopsys, Inc. (United States)
Naohiro Kobayashi, NEC Electronics (Japan)
Toshiaki Yanagihara, NEC Electronics (Japan)


Published in SPIE Proceedings Vol. 7275:
Design for Manufacturability through Design-Process Integration III
Vivek K. Singh; Michael L. Rieger, Editor(s)

© SPIE. Terms of Use
Back to Top