Share Email Print

Proceedings Paper

Algorithm for determining printability and colouring of a target layout for double patterning
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

An algorithm is presented which performs a model-based colouring of a given layout for double patterning. The algorithm searches the space of patterns which can be printed with a particular wavelength and numerical aperture, and seeks to find a pair of patterns which combine to produce the desired target layout. This is achieved via a cost function which encodes the geometry of the layout and allowable edge placement tolerances. If the layout is not printable by double patterning, then the algorithm provides a closest solution and indicates hotspots where the target is not feasible.

Paper Details

Date Published: 12 March 2009
PDF: 12 pages
Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750O (12 March 2009); doi: 10.1117/12.814321
Show Author Affiliations
Justin Ghan, Univ. of California, Berkeley (United States)
Apo Sezginer, Cadence Design Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 7275:
Design for Manufacturability through Design-Process Integration III
Vivek K. Singh; Michael L. Rieger, Editor(s)

© SPIE. Terms of Use
Back to Top