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Proceedings Paper

Inspection 13.2-nm table-top full-field microscope
Author(s): F. Brizuela; Y. Wang; C. A. Brewer; F. Pedaci; W. Chao; E. H. Anderson; Y. Liu; K. A. Goldberg; P. P. Naulleau; P. W. Wachulak; M. C. Marconi; D. T. Attwood; J. J. Rocca; C. S. Menoni
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Paper Abstract

We present results on a table-top microscope that uses an EUV stepper geometry to capture full-field images with a halfpitch spatial resolution of 55 nm. This microscope uses a 13.2 nm wavelength table-top laser for illumination and acquires images of reflective masks with exposures of 20 seconds. These experiments open the path to the realization of high resolution table-top imaging systems for actinic defect characterization.

Paper Details

Date Published: 18 March 2009
PDF: 7 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72713F (18 March 2009); doi: 10.1117/12.814320
Show Author Affiliations
F. Brizuela, Colorado State Univ., Fort Collins (United States)
Y. Wang, Colorado State Univ., Fort Collins (United States)
C. A. Brewer, Colorado State Univ., Fort Collins (United States)
F. Pedaci, Colorado State Univ., Fort Collins (United States)
W. Chao, Lawrence Berkeley National Lab. (United States)
E. H. Anderson, Lawrence Berkeley National Lab. (United States)
Y. Liu, Lawrence Berkeley National Lab. (United States)
K. A. Goldberg, Lawrence Berkeley National Lab. (United States)
P. P. Naulleau, Lawrence Berkeley National Lab. (United States)
P. W. Wachulak, Colorado State Univ., Fort Collins (United States)
M. C. Marconi, Colorado State Univ., Fort Collins (United States)
D. T. Attwood, Lawrence Berkeley National Lab. (United States)
J. J. Rocca, Colorado State Univ., Fort Collins (United States)
C. S. Menoni, Colorado State Univ., Fort Collins (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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