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Proceedings Paper

Tabletop coherent diffractive microscopy with extreme ultraviolet light from high harmonic generation
Author(s): Daisy A. Raymondson; Richard L. Sandberg; William F. Schlotter; Kevin S. Raines; Chan La-o-Vorakiat; Ethan Townsend; Anne Sakdinawat; Ariel Paul; Jianwei Miao; Margaret M. Murnane; Henry C. Kapteyn
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Paper Abstract

We demonstrate lensless diffractive microscopy using a tabletop source of extreme ultraviolet (EUV) light from high harmonic generation at 29 nm and 13.5 nm. High harmonic generation has been shown to produce fully spatially coherent EUV light when the conversion process is well phase-matched in a hollow-core waveguide. We use this spatial coherence for two related diffractive imaging techniques which circumvent the need for lossy imaging optics in the EUV region of the spectrum. Holography with a reference beam gives sub-100 nm resolution in short exposure times with fast image retrieval. Application of the Guided Hybrid Input-Output phase retrieval algorithm refines the image resolution to 53 nm with 29 nm light. Initial images using the technologically important 13.5 nm wavelength give 92-nm resolution in a 10-minute exposure. Straightforward extensions of this work should also allow near-wavelength resolution with the 13.5 nm source. Diffractive imaging techniques provide eased alignment and focusing requirements as compared with zone plate or multilayer mirror imaging systems. The short-pulsed nature of the extreme ultraviolet source will allow pump-probe imaging of materials dynamics with time resolutions down to the pulse duration of the EUV.

Paper Details

Date Published: 23 March 2009
PDF: 8 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720F (23 March 2009); doi: 10.1117/12.814313
Show Author Affiliations
Daisy A. Raymondson, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Richard L. Sandberg, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
William F. Schlotter, Univ. Hamburg (Germany)
Kevin S. Raines, Univ. of California, Los Angeles (United States)
Chan La-o-Vorakiat, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Ethan Townsend, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Anne Sakdinawat, Lawrence Berkeley National Lab. (United States)
Ariel Paul, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Jianwei Miao, Univ. of California, Los Angeles (United States)
Margaret M. Murnane, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Henry C. Kapteyn, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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