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Proceedings Paper

Protection efficiency of a standard compliant EUV reticle handling solution
Author(s): Long He; John Lystad; Stefan Wurm; Kevin Orvek; Jaewoong Sohn; Andy Ma; Patrick Kearney; Steve Kolbow; David Halbmaier
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Paper Abstract

For successful implementation of extreme ultraviolet lithography (EUVL) technology for late cycle insertion at 32 nm half-pitch (hp) and full introduction for 22 nm hp high volume production, the mask development infrastructure must be in place by 2010. The central element of the mask infrastructure is contamination-free reticle handling and protection. Today, the industry has already developed and balloted an EUV pod standard for shipping, transporting, transferring, and storing EUV masks. We have previously demonstrated that the EUV pod reticle handling method represents the best approach in meeting EUVL high volume production requirements, based on then state-of-the-art inspection capability at ~53nm polystyrene latex (PSL) equivalent sensitivity. In this paper, we will present our latest data to show defect-free reticle handling is achievable down to 40 nm particle sizes, using the same EUV pod carriers as in the previous study and the recently established world's most advanced defect inspection capability of ~40 nm SiO2 equivalent sensitivity. The EUV pod is a worthy solution to meet EUVL pilot line and pre-production exposure tool development requirements. We will also discuss the technical challenges facing the industry in refining the EUV pod solution to meet 22 nm hp EUVL production requirements and beyond.

Paper Details

Date Published: 18 March 2009
PDF: 10 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72710I (18 March 2009); doi: 10.1117/12.814304
Show Author Affiliations
Long He, SEMATECH, Inc. (United States)
Intel Corp. (United States)
John Lystad, Entegris, Inc. (United States)
Stefan Wurm, SEMATECH, Inc. (United States)
Kevin Orvek, SEMATECH, Inc. (United States)
Jaewoong Sohn, SEMATECH, Inc. (United States)
Andy Ma, Intel Corp. (United States)
Patrick Kearney, SEMATECH, Inc. (United States)
Steve Kolbow, Entegris, Inc. (United States)
David Halbmaier, Entegris, Inc. (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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