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Proceedings Paper

MOSAIC: a new wavefront metrology
Author(s): Christopher N. Anderson; Patrick P. Naulleau
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Paper Abstract

MOSAIC is a new wavefront metrology that enables complete wavefront characterization from print or aerial image based measurements. Here we describe MOSAIC and verify its utility with a model-based proof of principle.

Paper Details

Date Published: 23 March 2009
PDF: 7 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720B (23 March 2009); doi: 10.1117/12.814303
Show Author Affiliations
Christopher N. Anderson, Univ. of California, Berkeley (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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