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Proceedings Paper

Pattern matching assisted modeling test pattern generation
Author(s): Le Hong; Qiao Li; Jian Rao
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Paper Abstract

Generating test patterns with sufficient parameter space coverage has always been one of the critical steps towards building good OPC models. The advancement in technology node requires continues updates to OPC modeling test patterns. The traditional approach relies heavily on experiences gathered from older technology nodes. It often requires rounds of costly test tape out. Here we propose an automated flow for test pattern generation utilizing a fast full chip pattern matching algorithm. We describe the implementation of the flow. We also present experimental results and discuss the benefit and challenges of the proposed flow.

Paper Details

Date Published: 16 March 2009
PDF: 10 pages
Proc. SPIE 7274, Optical Microlithography XXII, 727429 (16 March 2009); doi: 10.1117/12.814302
Show Author Affiliations
Le Hong, Mentor Graphics Corp. (United States)
Qiao Li, Mentor Graphics Corp. (United States)
Jian Rao, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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