Share Email Print
cover

Proceedings Paper

Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography
Author(s): Adam J. Berro; Xinyu Gu; Naphtali O'Connor; Steffen Jockusch; Tomoki Nagai; Toshiyuki Ogata; Paul Zimmerman; Bryan J. Rice; Elizabeth Adolph; Travis Byargeon; Jose Gonzalez; Nicholas J. Turro; C. Grant Willson
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Intermediate state two-photon (ISTP) photoacid generator (PAG) and optical threshold layer (OTL) approaches to double exposure lithography have been explored. We have synthesized "transparent" PAG and sensitizer compounds for use in ISTP systems and have demonstrated the possibility of utilizing such energy transfer systems to generate acid. We have also synthesized side chain liquid crystalline polymers and small molecule azobenzene compounds for use in OTL applications and have begun photoswitching studies.

Paper Details

Date Published: 1 April 2009
PDF: 10 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72731B (1 April 2009); doi: 10.1117/12.814295
Show Author Affiliations
Adam J. Berro, The Univ. of Texas at Austin (United States)
Xinyu Gu, The Univ. of Texas at Austin (United States)
Naphtali O'Connor, Columbia Univ. (United States)
Steffen Jockusch, Columbia Univ. (United States)
Tomoki Nagai, The Univ. of Texas at Austin (United States)
Toshiyuki Ogata, The Univ. of Texas at Austin (United States)
Paul Zimmerman, SEMATECH Inc. (United States)
Bryan J. Rice, SEMATECH Inc. (United States)
Elizabeth Adolph, The Univ. of Texas at Austin (United States)
Travis Byargeon, The Univ. of Texas at Austin (United States)
Jose Gonzalez, The Univ. of Texas at Austin (United States)
Nicholas J. Turro, Columbia Univ. (United States)
C. Grant Willson, The Univ. of Texas at Austin (United States)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

© SPIE. Terms of Use
Back to Top