Share Email Print
cover

Proceedings Paper

Positive identification of lithographic photoresists using real-time index of refraction monitoring for reduced cost of ownership
Author(s): Ron Jee; Susanne Pepper; David Stedman
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This study involved installation of a real-time refractive index monitoring system into a simulated photoresist feed line as would be used for delivery to a lithography tool. The goal was to determine whether this refractive index technology could be used to differentiate among all possible photoresists that could potentially be delivered to a lithography tool and resolve each one, separate from the others. The main intention is to use this technology to prevent the wrong photoresist from being used. The use of the wrong photoresist could result in hundreds of thousands of dollars per year in wafers scrapped in late stages of the process flow. A Swagelok(R) CR-288(R) concentration monitor, using refractive index (RI) sensing, was installed into a simulated photoresist feed line to monitor and detect each one in real time. By integrating the CR-288 concentration monitor into the lithographic process system, the capability for uniquely identifying and resolving 10 out of 10 Deep Ultra Violet (DUV) photoresists was demonstrated, potentially leading to a large cost avoidance and reduced cost of ownership.

Paper Details

Date Published: 23 March 2009
PDF: 12 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727223 (23 March 2009); doi: 10.1117/12.814291
Show Author Affiliations
Ron Jee, Swagelok Co. (United States)
Susanne Pepper, Swagelok Co. (United States)
David Stedman, Swagelok Co. (United States)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

© SPIE. Terms of Use
Back to Top