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Proceedings Paper

Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system
Author(s): Fred de Jong; Bert van der Pasch; Tom Castenmiller; Bert Vleeming; Richard Droste; Frank van de Mast
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Paper Abstract

The lithography roadmap demands overlay reduction along with increased productivity. New applications are proposed as lithography solution for the 32-nm node and possibly beyond. Most of them require very tight overlay and multiple exposures. Major contributors in the overlay budget are coming from the exposure system, like thermal stability, lens aberrations stability, stage positioning and alignment. An additional complexity is the interaction with the actual process and the pattern on the reticle. To keep the lithography roadmap affordable, the cost per wafer needs to be tamed by boosting the productivity of the exposure tool. To enable new applications in a production environment a new generation lithographic exposure tools was developed, with improved overlay and increased productivity. The optical column contains an improved 1.35 NA immersion lens. Compared to the former generation the combination of overlay and productivity requirements are met by a high acceleration wafer stage along with a new stage position measurement system, introducing new technologies paving the way to meet the future roadmap requirements. The increased disturbances caused by the higher accelerations are countered by a short-beam interferometer system thus ensuring optimal positioning performance. Further productivity enhancements are reached by reducing non-exposure time. The latest performance results will be presented; this will include overlay results as well as other critical system performance data.

Paper Details

Date Published: 16 March 2009
PDF: 10 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72741S (16 March 2009); doi: 10.1117/12.814254
Show Author Affiliations
Fred de Jong, ASML Netherlands B.V. (Netherlands)
Bert van der Pasch, ASML Netherlands B.V. (Netherlands)
Tom Castenmiller, ASML Netherlands B.V. (Netherlands)
Bert Vleeming, ASML Netherlands B.V. (Netherlands)
Richard Droste, ASML Netherlands B.V. (Netherlands)
Frank van de Mast, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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