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Proceedings Paper

The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond
Author(s): Patrick P. Naulleau; Christopher N. Anderson; Lorie-Mae Baclea-an; Paul Denham; Simi George; Kenneth A. Goldberg; Michael Goldstein; Brian Hoef; Russ Hudyma; Gideon Jones; Chawon Koh; Bruno La Fontaine; Brittany McClinton; Ryan H. Miyakawa; Warren Montgomery; John Roller; Thomas Wallow; Stefan Wurm
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Paper Abstract

Microfield exposure tools (METs) continue to play a dominant role in the development of extreme ultraviolet (EUV) resists. One of these tools is the SEMATECH Berkeley 0.3-NA MET operating as a SEMATECH resist and mask test center. Here we present an update summarizing the latest resist test and characterization results. The relatively small numerical aperture and limited illumination settings expected from 1st generation EUV production tools make resist resolution a critical issue even at the 32-nm node. In this presentation, sub 22 nm half pitch imaging results of EUV resists are reported. We also present contact hole printing at the 30-nm level. Although resist development has progressed relatively well in the areas of resolution and sensitivity, line-edge-roughness (LER) remains a significant concern. Here we present a summary of recent LER performance results and consider the effect of system-level contributors to the LER observed from the SEMATECH Berkeley microfield tool.

Paper Details

Date Published: 17 March 2009
PDF: 11 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72710W (17 March 2009); doi: 10.1117/12.814232
Show Author Affiliations
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Christopher N. Anderson, Univ. of California, Berkeley (United States)
Lorie-Mae Baclea-an, Lawrence Berkeley National Lab. (United States)
Paul Denham, Lawrence Berkeley National Lab. (United States)
Simi George, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Michael Goldstein, SEMATECH, Inc. (United States)
Brian Hoef, Lawrence Berkeley National Lab. (United States)
Russ Hudyma, Hyperion (United States)
Gideon Jones, Lawrence Berkeley National Lab. (United States)
Chawon Koh, SEMATECH, Inc. (United States)
Bruno La Fontaine, Advanced Micro Devices, Inc. (United States)
Brittany McClinton, Lawrence Berkeley National Lab. (United States)
Ryan H. Miyakawa, Lawrence Berkeley National Lab. (United States)
Warren Montgomery, SEMATECH, Inc. (United States)
John Roller, Lawrence Berkeley National Lab. (United States)
Thomas Wallow, Advanced Micro Devices, Inc. (United States)
Stefan Wurm, SEMATECH, Inc. (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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