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Proceedings Paper

Illustration of illumination effects on proximity, focus spillover, and design rules
Author(s): Lynn T.-N. Wang; Anthony Yeh; Lilly Kem; Andrew R. Neureuther
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Paper Abstract

Visualization at the mask plane of the effects of illumination, proximity, and defocus is used to give physical insight into restricted design rules, layout choices, and residual edge placement errors. To facilitate this work, a pattern matching code has been tuned, tested, and enhanced. The richness of the original code with complex match factors, mask Boolean operations, and mask weights and phases has been adapted to operate on clear-field attenuated-phase-shifting masks with asymmetrical illumination. To account for illumination effects, the aberration spillover is multiplied by the Fourier transform of the angular distribution of the intensity spectrum incident on the mask. In a study of binary mask layouts, the R-squared correlation of the prediction of image intensity with Pattern Match Factor increased from 0.57 to 0.89 when annular illumination was included in the spillover function. In addition, features to visualize the mutual coherence, shifts of the illumination, and source maps have been added.

Paper Details

Date Published: 12 March 2009
PDF: 10 pages
Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750B (12 March 2009); doi: 10.1117/12.814222
Show Author Affiliations
Lynn T.-N. Wang, Univ. of California, Berkeley (United States)
Anthony Yeh, Univ. of California, Berkeley (United States)
Lilly Kem, Univ. of California, Berkeley (United States)
Andrew R. Neureuther, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 7275:
Design for Manufacturability through Design-Process Integration III
Vivek K. Singh; Michael L. Rieger, Editor(s)

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