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Proceedings Paper

Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging
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Paper Abstract

Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMATECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMATECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations were performed based on calculated aerial images and resist parameters. With the knowledge of the topography, simulations were then used to predict the effect of other thicknesses of the contamination layer, as well as the imaging performance on printed features.

Paper Details

Date Published: 18 March 2009
PDF: 9 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72713U (18 March 2009); doi: 10.1117/12.814196
Show Author Affiliations
Yu-Jen Fan, Univ. at Albany (United States)
Leonid Yankulin, Univ. at Albany (United States)
Alin Antohe, Univ. at Albany (United States)
Rashi Garg, Univ. at Albany (United States)
Petros Thomas, Univ. at Albany (United States)
Chimaobi Mbanaso, Univ. at Albany (United States)
Andrea Wüest, SEMATECH, Inc. (United States)
Frank Goodwin, SEMATECH, Inc. (United States)
Sungmin Huh, SEMATECH, Inc. (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)
Kenneth Goldberg, Lawrence Berkeley National Lab. (United States)
Iacopo Mochi, Lawrence Berkeley National Lab. (United States)
Gregory Denbeaux, Univ. at Albany (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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