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Proceedings Paper

Flare compensation for EUVL
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Paper Abstract

At Selete, correction for flare based on a flare point-spread function (PSFF) is investigated. We divide a layout into a grid and calculate pattern density for each grid square, obtaining a density array as an approximation to the layout aerial image. Then, the density array is convolved with the PSFF to create an array of flare values. Using this flare-value array, we resize the layout. In the above correction flow, size of a grid square of density array and a selection of an approximate function of the PSFF have a great influence on the accuracy of flare value computation. In this study, correction for flare was applied to the fabrication of several test masks using the real PSFF obtained from a full-field step-and-scan exposure tool called EUV1. We report on the optimization of size of grid square, on a suitable approximation model of PSFF, and on feedbacks from exposure experiments.

Paper Details

Date Published: 18 March 2009
PDF: 10 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727145 (18 March 2009); doi: 10.1117/12.814187
Show Author Affiliations
Yukiyasu Arisawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hajime Aoyama, Semiconductor Leading Edge Technologies, Inc. (Japan)
Taiga Uno, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshihiko Tanaka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Ichiro Mori, Semiconductor Leading Edge Technologies, Inc. (Japan)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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